Source: Phys.org, December 14, 2017
The technology developed by researchers in Singapore is applicable on both p-type and n-type silicon wafers, features homogenous junctions and standard fire-thorough screen-printed metal contacts with grids on both sides, resulting in a high-efficiency bifacial solar cell. It uses an advanced tunnel oxide and doped silicon layers, enabling excellent surface passivation in the non-contact cell regions along with very low-resistance and low-recombination screen-printed contacts. Using commercially available large-area Cz-Si wafers they recorded an average cell efficiency of 21.5%… read more.
Front image of a fully screen-printed monoPoly solar cell.