Phys.org November 10, 2020
A limitation of silicon is that high temperatures damage which limits the operating speed of silicon-based electronics. Researchers in Japan fabricated a single-crystal diamond wafer and polished it using plasma-assisted polishing to be nearly atomically smooth. Common methods of polishing the surface are slow and damaging to the material. The polished surface was unaltered chemically. The only detected impurity was a small amount of nitrogen from the original wafer preparation. The procedure can help replace some of the silicon components of electronic devices with diamond…read more. Open Access TECHNICAL ARTICLEÂ