Nanowerk  August 14, 2018 To overcome problems associated with laser processing of high-quality micro- and nanopatterns of diverse two-dimensional (2D) materials, researchers at UT Austin have developed an all-optical lithographic technique called optothermoplasmonic nanolithography (OTNL) to achieve high-throughput, versatile, and maskless patterning of different atomic layers. Taking graphene and molybdenum disulfide they have shown that both thermal oxidation and sublimation in the light-directed temperature field can lead to direct etching of the atomic layers. They demonstrated that by steering the laser beams programmable patterning of 2D materials into complex and large-scale nanostructures is possible. The method can be applied to […]