Phys.org May 30, 2024
Creating dual-mode patterns in the same area of the material increases the dimension of information storage and encryption security. However different patterns may lead to serious mutual interference in the process of manufacturing and usage. An international team of researchers (USA – Argonne National Laboratory, China) has demonstrated noninterfering dual-mode patterns by combining the structural color and chromatic polarization, which was designed with an azobenzene-containing linear liquid crystal copolymer featuring a photofluidization effect. The secondary imprinting was used to eliminate the partial damage to the structural color patterns during writing of the polarization patterns, thus obtaining dual-mode patterns without interference. According to the researchers their study provides a blueprint for the creation of advanced materials and sophisticated photopatterning techniques with potential cross-industry applications… read more. Open Access TECHNICAL ARTICLE
A new dual-mode security film reveals one image when light reflects off a pattern stamped on its surface… Credit: Langmuir 2024, XXXX, XXX, XXX-XXX, May 19, 2024