Nanowerk August 14, 2018
To overcome problems associated with laser processing of high-quality micro- and nanopatterns of diverse two-dimensional (2D) materials, researchers at UT Austin have developed an all-optical lithographic technique called optothermoplasmonic nanolithography (OTNL) to achieve high-throughput, versatile, and maskless patterning of different atomic layers. Taking graphene and molybdenum disulfide they have shown that both thermal oxidation and sublimation in the light-directed temperature field can lead to direct etching of the atomic layers. They demonstrated that by steering the laser beams programmable patterning of 2D materials into complex and large-scale nanostructures is possible. The method can be applied to Plasmonic biosensors, Field effect transistors, and Photon detectors… read more. TECHNICAL ARTICLEÂ
General concept of OTNL. Reprinted with permission by Wiley-VCH Verlag