Nanowerk  February 5, 2019 Atomic layer deposition method has been used mainly in electronic applications. An international team of researchers (Finland, France, UK) reports ultra-high on-chip optical gain in erbium-based hybrid slot waveguides with a monolithic, CMOS-compatible and scalable atomic-layer deposition process. They have demonstrated up to 20.1 ± 7.31 dB/cm and at least 52.4 ± 13.8 dB/cm net modal and material gain per unit length, respectively. The study showed that a light signal can be potentially boosted regarless of the structure of the microchip. The results indicate that atomic layer deposition is a promising method for developing microchip photonic processes…read more. Open Access TECHNICAL ARTICLE